The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7023393 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 04, 2006

Filed:

Oct. 28, 2003
Applicants:

Nobuo Ishii, Kobe, JP;

Makoto Ando, Kawasaki-shi, Kanagawa 211-0954, JP;

Masaharu Takahashi, Yachiyo-shi, Chiba 276-0049, JP;

Inventors:

Nobuo Ishii, Kobe, JP;

Makoto Ando, Kawasaki-shi, Kanagawa 211-0954, JP;

Masaharu Takahashi, Yachiyo-shi, Chiba 276-0049, JP;

Assignees:

Tokyo Electron Limited, Tokyo, JP;

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 13/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A slot array antenna, consistent with the invention can include a power feeding waveguide for feeding microwave power and a plurality of rectangular radiating waveguides. The plurality of rectangular radiating waveguides are connected to a plurality of windows which are disposed along the longitudinal direction of the power feeding waveguide so as to guide the microwave power from the plurality of windows to the outside of the antenna. In each of the radiating waveguides, the interval 'd' between the centers of gravity of slot pairs or slots is substantially the same as the wavelength λm of the microwave in the rectangular radiating waveguide. A slot array antenna of the present invention can be used in a plasma processing apparatus to increase the plasma density in the plasma-processing chamber.


Find Patent Forward Citations

Loading…