The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Jul. 16, 2003
Applicants:
Winfried Sabisch, München, DE;
Alfred Kersch, Putzbrunn, DE;
Georg Schulze-icking, Ottobrunn, DE;
Thomas Witke, Dresden, DE;
Ralf Zedlitz, Dresden, DE;
Inventors:
Winfried Sabisch, München, DE;
Alfred Kersch, Putzbrunn, DE;
Georg Schulze-Icking, Ottobrunn, DE;
Thomas Witke, Dresden, DE;
Ralf Zedlitz, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract
A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.