The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Mar. 27, 2003
Kazuya Kamon, Tokyo, JP;
Kazuya Kamon, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
Provided is a mask data processor capable of expanding a design data throughout the entire area of a mask. A storage device (MR) inputs a design data of sub-chips (D) and mask data creation specification data (D) to a pattern-density data generation device (). Then, a data execution part () performs an arithmetic execution to the design data of sub-chips (D) based on the mask data creation specification data (D), followed by automatic mask data generation processing, layer arithmetic execution processing, and dummy pattern generation processing. When calculating a pattern graphic area, a graphic area calculation part () eliminates any overlap between graphics in order to avoid duplicate calculation. Based on the pattern graphic area, a pattern-density data calculation part () calculates the area ratios of graphic elements, i.e., pattern elements, contained in a unit region.