The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
May. 04, 2001
Gregory J. Wilson, Kalispell, MT (US);
Paul R. Mchugh, Kalispell, MT (US);
Robert A. Weaver, Whitefish, MT (US);
Thomas L. Ritzdorf, Bigfork, MT (US);
Gregory J. Wilson, Kalispell, MT (US);
Paul R. McHugh, Kalispell, MT (US);
Robert A. Weaver, Whitefish, MT (US);
Thomas L. Ritzdorf, Bigfork, MT (US);
Semitool, Inc., Kalispell, MT (US);
Abstract
A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.