The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Aug. 12, 2002
Byoung-moon Yoon, Suwon, KR;
In-jun Yeo, Suwon, KR;
Sang-rok Hah, Seoul, KR;
Kyung-hyun Kim, Seoul, KR;
Hyun-ho JO, Seoul, KR;
Jeong-lim Nam, Yongin, KR;
Byoung-moon Yoon, Suwon, KR;
In-jun Yeo, Suwon, KR;
Sang-rok Hah, Seoul, KR;
Kyung-hyun Kim, Seoul, KR;
Hyun-ho Jo, Seoul, KR;
Jeong-lim Nam, Yongin, KR;
Samsung Electronics., Co.,Ltd., Kyungki-Do, KR;
Abstract
A megasonic cleaning apparatus is provided for removing contamination particles on a wafer. The megasonic cleaning apparatus includes a piezoelectric transducer and an energy transfer rod. The piezoelectric transducer is for generating megasonic energy. The energy transfer rod installed over the wafer along a radial direction of the wafer is for distributing the megasonic energy to cleaning solution over the wafer and for vibrating the cleaning solution. The energy transfer rod is shaped and sized to uniformly distribute energy in the radial direction of the wafer through the cleaning solution to remove the contamination particles from the wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile