The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2006
Filed:
Apr. 29, 2003
Chongying Xu, New Milford, CT (US);
Michael Korzenski, Danbury, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Alexander Borovik, West Hartford, CT (US);
Eliodor G. Ghenciu, King of Prussia, PA (US);
Chongying Xu, New Milford, CT (US);
Michael Korzenski, Danbury, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Alexander Borovik, West Hartford, CT (US);
Eliodor G. Ghenciu, King of Prussia, PA (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Drying of patterned wafers is achieved in a manner effecting removal of water from the patterned wafers without collapse or deterioration of the pattern structures thereof. The drying is carried out in one aspect of the invention with a composition containing supercritical fluid, and at least one water-reactive agent that chemically reacts with water to form reaction product(s) more soluble in the supercritical fluid than water. Various methodologies are described for use of supercritical fluids to dry patterned wafers, which avoid the (low water solubility) deficiency of supercritical fluids such as supercritical CO.