The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Jan. 07, 2003
Alexander Starikov, Palo Alto, CA (US);
Theodore Doros, Sunnyvale, CA (US);
Alexander Starikov, Palo Alto, CA (US);
Theodore Doros, Sunnyvale, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
In an embodiment in accordance with the present invention, methods for dynamic detection and correction of focus and tilt variations that occur during a specific product layer exposure is by focus and tilt pre-compensation during wafer exposure. The method provides two spaced apart paths that provide both defocus and tilt measurements. A reference plane is defined by using three reference areas or fields. The data is fitted, using least squares or max/min error, to a 'plane', that is, to straight equidistant lines, the deviation from 'plane' is computed as error from a set of straight equidistant lines. Lateral displacements of each band into focus error is converted using the formula: ΔZ=ΔX*θ.