The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Apr. 02, 2005
Brian Lee Buss, Emmaus, PA (US);
Robert Dale Ickes, Jr., Blandon, PA (US);
Wayne Alan Rademacher, Jordon, MN (US);
Brian Lee Buss, Emmaus, PA (US);
Robert Dale Ickes, Jr., Blandon, PA (US);
Wayne Alan Rademacher, Jordon, MN (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
A cantilever probe method of parametrically testing wafers extends the probe tip cleaning interval, maintains relatively low contact resistance, and reduces contact resistance variability. In one embodiment of our invention, a method of testing electronic circuits formed in a wafer having lead-free terminals, comprises the steps of exposing the terminals to a plasma containing oxygen; providing a test apparatus having cantilevered probes for contacting the terminals; each probe having a cantilevered probe arm and a BeCu probe tip extending from the arm at an acute angle α; the angle α being designed to essentially eliminate sliding movement of the probe tip when in contact with a terminal; and bringing the probe tips into contact with selected ones of the terminals, so as to perform electrical tests on the wafer; and, during the contacting step, exposing the probe tips to a flow of a non-oxidizing gas (e.g, nitrogen, argon). In a preferred embodiment, the terminals are Sn-based solder bumps. In another preferred embodiment the angle α is approximately 87°–90°.