The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Mar. 22, 2002
Yoshiro Shiokawa, Hachioji, JP;
Megumi Nakamura, Fuchu, JP;
Tohru Sasaki, Fuchu, JP;
Toshihiro Fujii, Hamura, JP;
Yoshiro Shiokawa, Hachioji, JP;
Megumi Nakamura, Fuchu, JP;
Tohru Sasaki, Fuchu, JP;
Toshihiro Fujii, Hamura, JP;
Anelva Corporation, Tokyo, JP;
Abstract
An ionization apparatus according to the present invention has a mechanism for causing metal ions emitted from an ion emitter to attach to an introduced target gas so as to generate ions of the sample gas and emits the ions of the sample gas to a mass spectrometer. The mass spectrometer has a zone in which one or both of an electric field and magnetic field are formed. As the electrode for causing the generation of cleaning plasma in the ionization zone generating the ions of the sample gas, the ion emitter is used. The ion emitter causes the generation of plasma in connection with a hollow vessel and removes deposits on components facing the ionization zone by the plasma. The plasma cleaning process is performed consecutively at a suitable timing after the ionization process. Due to the above configuration, deteriorated performance in ionization can be restored in a short time, a memory effect can be prevented, and accurate mass spectrometry becomes possible. The ionization apparatus of the present invention is suitable for a mass spectrometry apparatus.