The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Dec. 15, 2003
Applicant:
Srivatsa Kundalgurki, Dresden, DE;
Inventor:
Srivatsa Kundalgurki, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a method for removing a resist selective to a carbon hard mask including providing an etching plasma comprising of at least hydrogen at a predetermined temperature level and a predetermined pressure level in a reaction chamber, and etching the resist selectively to the mask with said plasma for a predetermined period of time.
Kundalgurki, Srivatsa. (2006). Method for removing a resist mask with high selectivity to a carbon hard mask used for semiconductor structuring (U.S. Patent No. 7005385). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7005385
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile