The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Jan. 16, 2003
Applicants:
Masafumi Yamamoto, Tokyo, JP;
Hidemitsu Ishida, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Toru Kajita, Tokyo, JP;
Inventors:
Masafumi Yamamoto, Tokyo, JP;
Hidemitsu Ishida, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Toru Kajita, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays