The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Feb. 28, 2003
Applicants:
Gerard Stephen Moloney, Milpitas, CA (US);
Huey-ming Wang, Fremont, CA (US);
Peter Lao, San Jose, CA (US);
Inventors:
Gerard Stephen Moloney, Milpitas, CA (US);
Huey-Ming Wang, Fremont, CA (US);
Peter Lao, San Jose, CA (US);
Assignee:
Ebara Technologies, Inc., Sacramento, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.
Moloney, Gerard. (2006). Chemical mechanical polishing and pad dressing method (U.S. Patent No. 7004822). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7004822
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile