The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

Jul. 25, 2005
Applicants:

Tatsuya Sakai, Chuo-ku, JP;

Sachiko Hashimoto, Chuo-ku, JP;

Yasuo Matsuki, Chuo-ku, JP;

Inventors:

Tatsuya Sakai, Chuo-ku, JP;

Sachiko Hashimoto, Chuo-ku, JP;

Yasuo Matsuki, Chuo-ku, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical vapor deposition material comprising a ruthenium compound having a ligand represented by the following formula:wherein R, Rand Rare each independently a hydrogen atom, fluorine atom, trifluoromethyl group or hydrocarbon group having 1 to 10 carbon atoms, A high-quality ruthenium film even when it is very thin can be obtained.


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