The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Sep. 09, 2003
Szetsen Steven Lee, Hsinchu, TW;
Szetsen Steven Lee, Hsinchu, TW;
Winbond Electronics Corp., Hsinchu, TW;
Abstract
A method for detecting the end point of plasma etching process by using matrix comprises a step of detecting a beginning matrix including emitting intensities and/or other plasma parameters of at least two different plasma species during beginning etching process. Then, a step of detecting an etching matrix is performed in which the etching matrix includes emitting intensities and/or other plasma parameters of the at least two different plasma species at the etching reaction. An end point matrix is then computed by using the beginning as well as etching matrices and compared to a reference end point matrix to decide whether the end point is reached.