The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Mar. 17, 2004
Applicants:
Seiichi Fukuda, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Inventors:
Seiichi Fukuda, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/469 (2006.01); C23C 14/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of the substrate comprises a pulse modulator for pulse modulation of the high-frequency electric field. By applying the high-frequency electric field in a pulsed form, it is possible to realize a nitriding by which the peak of nitrogen concentration is located at a shallower position and a desired nitrogen concentration can be obtained.