The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Jan. 02, 2002
Applicants:
Baiming Gao, Shanghai, CN;
Yun Wang, Shanghai, CN;
Yigal Zemach, Rehovot, IL;
Orna Etzion, Haifa, IL;
Jianhui LI, Shanghai, CN;
Inventors:
Baiming Gao, Shanghai, CN;
Yun Wang, Shanghai, CN;
Yigal Zemach, Rehovot, IL;
Orna Etzion, Haifa, IL;
Jianhui Li, Shanghai, CN;
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/45 (2006.01);
U.S. Cl.
CPC ...
Abstract
Mapping of exception masks between source and target architectures with different numbers of exception masks enables a binary translator to translate code from the source to the target architecture and to determine an appropriate state for the source architecture if an exception is raised when executing the translated code.