The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Aug. 18, 2003
Ayako Nakano, Yokohama, JP;
Koji Hashimoto, Yokohama, JP;
Takashi Sato, Fujisawa, JP;
Tsuyoshi Shibata, Yokohama, JP;
Yuji Kobayashi, Yokohama, JP;
Ayako Nakano, Yokohama, JP;
Koji Hashimoto, Yokohama, JP;
Takashi Sato, Fujisawa, JP;
Tsuyoshi Shibata, Yokohama, JP;
Yuji Kobayashi, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of designing patterns has preparing a mask pattern used in a lithography process for transferring a circuit pattern intersecting with a step pattern on a substrate which has the step pattern designed thereon, and applying correction patterns to the mask pattern in accordance with correction rules considering a shape of the step pattern, the correction patterns being applied at intersections of edges of the circuit pattern and the step pattern and in the vicinity of the intersections.