The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Sep. 17, 2003
Min-yi Hsu, Changhua, TW;
Hsin-jung Ho, Taipei, TW;
Kun-shin Huang, Keeling, TW;
Yi-nan Chen, Taipei, TW;
Kaanlu Tzou, Taipei, TW;
Min-Yi Hsu, Changhua, TW;
Hsin-Jung Ho, Taipei, TW;
Kun-Shin Huang, Keeling, TW;
Yi-Nan Chen, Taipei, TW;
Kaanlu Tzou, Taipei, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A method of reworking an integrated circuit device is described. A substrate having a dielectric layer, a barrier layer, a conductive layer and an anti-reflective layer formed thereon, is provided. The method of reworking the barrier layer, the conductive layer and the anti-reflective layer comprises removing the anti-reflection layer by performing a dry etching process, removing the conductive layer by performing a wet etching process, and then removing the barrier layer by performing a chemical machine polishing process.