The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2006

Filed:

Jan. 30, 2003
Applicant:

Fang-cheng Chang, Sunnyvale, CA (US);

Inventor:

Fang-Cheng Chang, Sunnyvale, CA (US);

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A two-dimensional yield map for a device, such as an integrated circuit, in a fabrication facility is computed and associated with layout data for the device in a hierarchical and/or instance-based layout file. The device has a layout including a pattern characterizable by a combination of members of a set of basis shapes. A set of basis pre-images include yield map data representing an interaction of respective members of the set of basis shapes with a defect model. A yield map for the pattern is created by combining basis pre-images corresponding to basis shapes in the combination of members that characterize the pattern to provide a combination result. The output may be displayed as a two dimensional map to an engineer performing yield analysis, or otherwise processed.


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