The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Mar. 29, 2005
Satyadev R. Patel, Sunnyvale, CA (US);
Andrew G. Huibers, Palo Alto, CA (US);
Steve S. Chiang, Saratoga, CA (US);
Satyadev R. Patel, Sunnyvale, CA (US);
Andrew G. Huibers, Palo Alto, CA (US);
Steve S. Chiang, Saratoga, CA (US);
Reflectivity, Inc, Sunnyvale, CA (US);
Abstract
A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.