The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Jan. 31, 2003
Applicants:
Takumi Kadota, Yamaguchi, JP;
Chihiro Hasegawa, Yamaguchi, JP;
Kouhei Watanuki, Yamaguchi, JP;
Inventors:
Assignee:
UBE Industries, Ltd., , JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 1/08 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Copper-containing thin films can be industrially advantageously formed by chemical vapor deposition using as the copper source a divalent copper complex bearing β-diketonato ligands having silyl ether linkage. A representative example of the divalent copper complex is represented by the formula (I):wherein Z is hydrogen or alkyl; X is a group represented by the formula (I—I), in which Ris alkylene, and each of R, Rand Ris alkyl; and Y is an alkyl group or a group represented by the formula (I—I), in which Ris alkylene, and each of R, Rand Ris alkyl.