The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Feb. 22, 2001
Shigeru Maida, Nakakubiki-gun, JP;
Motoyuki Yamada, Nakakubiki-gun, JP;
Hisatoshi Otsuka, Nakakubiki-gun, JP;
Kazuo Shirota, Nakakubiki-gun, JP;
Koji Matsuo, Nakakubiki-gun, JP;
Shigeru Maida, Nakakubiki-gun, JP;
Motoyuki Yamada, Nakakubiki-gun, JP;
Hisatoshi Otsuka, Nakakubiki-gun, JP;
Kazuo Shirota, Nakakubiki-gun, JP;
Koji Matsuo, Nakakubiki-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.