The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Sep. 02, 2003
Go Fujinawa, Hamura, JP;
Hitoshi Okanda, Hachioji, JP;
Go Fujinawa, Hamura, JP;
Hitoshi Okanda, Hachioji, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.