Electron-beam writing device and electron-beam writing method

Abstract

The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation meanscalculates the start-to-end point distance L of a writing pattern (S), and number-of-scan-clocks calculating meanscalculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter(S). Count conversion meansseparates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S). Based on the equation, variable rate calculating meanscalculates an extinction ratio to determine the extinction ratio at a variable attenuator(S). ATT D/A converterspecifies the extinction ratio at the attenuatorto reduce the unit distance corresponding to the resolving power of the high-speed D/A converterso that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.