The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Apr. 14, 2003
Sriram Ramamoorthi, Corvallis, OR (US);
Zhizhang Chen, Corvallis, OR (US);
John Liebeskind, Corvallis, OR (US);
Ronald L. Enck, Corvallis, OR (US);
Jennifer Shih, Corvallis, OR (US);
Sriram Ramamoorthi, Corvallis, OR (US);
Zhizhang Chen, Corvallis, OR (US);
John Liebeskind, Corvallis, OR (US);
Ronald L. Enck, Corvallis, OR (US);
Jennifer Shih, Corvallis, OR (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A method of manufacturing a getter structure, including forming a support structure having a support perimeter, where the support structure is disposed over a substrate. In addition, the method includes forming a non-evaporable getter layer having an exposed surface area, where the non-evaporable getter layer is disposed over the support structure, and includes forming a vacuum gap between the substrate and the non-evaporable getter layer. The non-evaporable getter layer extends beyond the support perimeter of the support structure increasing the exposed surface area.