The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Jul. 15, 2003
Richard P. Good, Austin, TX (US);
Timothy L. Jackson, Pflugerville, TX (US);
Brian K. Cusson, Austin, TX (US);
Richard P. Good, Austin, TX (US);
Timothy L. Jackson, Pflugerville, TX (US);
Brian K. Cusson, Austin, TX (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
A method includes processing a plurality of workpieces to form at least one feature on each workpiece. A plurality of characteristics of the feature is measured. A covariance matrix including diagonal and non-diagonal terms for the plurality of characteristics measured is constructed. At least the non-diagonal terms of the covariance matrix are monitored. A sampling plan for measuring the workpieces is determined based on the monitoring. A system includes a plurality of tools, at least one metrology tool, and a sampling controller. The tools are configured to process a plurality of workpieces to form at least one feature on each workpiece. The metrology tool is configured to measure a plurality of characteristics of the feature. The sampling controller is configured to construct a covariance matrix including diagonal and non-diagonal terms for the plurality of characteristics measured, monitor at least the non-diagonal terms of the covariance matrix, and determine a sampling plan for measuring the workpieces based on the monitoring.