The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Apr. 25, 2003
Hsi-kuei Cheng, Hsin-Chu, TW;
Chu-chang Chen, Hsin-Chu, TW;
Ting-chun Wang, Hsin-Chu, TW;
Szu-an Wu, Hsin-Chu, TW;
Ying-lang Wang, Hsin-Chu, TW;
Hsien-ping Feng, Hsin-Chu, TW;
Hsi-Kuei Cheng, Hsin-Chu, TW;
Chu-Chang Chen, Hsin-Chu, TW;
Ting-Chun Wang, Hsin-Chu, TW;
Szu-An Wu, Hsin-Chu, TW;
Ying-Lang Wang, Hsin-Chu, TW;
Hsien-Ping Feng, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A system and method for detecting chamber leakage by measuring the reflectivity of an oxidized thin film. In a preferred embodiment, a method of detecting leaks in a chamber includes providing a first monitor workpiece, placing the first monitor workpiece in the chamber, and forming at least one film on the first monitor workpiece. The reflectivity of the least one film of the first monitor workpiece is measured, wherein the reflectivity indicates whether there are leaks in the at least one seal of the chamber. In another embodiment, the method includes providing a second monitor workpiece, placing the second monitor workpiece in the chamber, and forming at least one film on the second monitor workpiece. The reflectivity of the at least one film of the second monitor workpiece is measured, and the second monitor workpiece film reflectivity is compared to the first monitor workpiece film reflectivity.