The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Mar. 21, 2005
Kent K. Tam, Rowland Heights, CA (US);
Kent K. Tam, Rowland Heights, CA (US);
Northrop Grumman Corporation, Los Angeles, CA (US);
Abstract
The invention is a process for determining the resistivity of a layered structure including a layer of resistive material hidden under a topcoat and a tile layer, the process comprises the steps of; 1) directing electromagnetic radiation over a selected frequency range to the outer surface of the layered structure; 2) measuring the reflection of the electromagnetic radiation from the layered structure surface; 3) converting the signal into the time domain; 4) analyzing the first echo to obtain the topcoat thickness; 5) obtaining the tile thickness from the time delay between the first and second echoes; 6) compensating the second echo with electromagnetic power loss due to the topcoat and tile; and 7) determining the resistance of the resistive layer from the compensated second echo.