The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2006
Filed:
Mar. 12, 2004
Applicants:
James M. Cleeves, Redwood City, CA (US);
Michael A. Vyvoda, Fremont, CA (US);
Inventors:
James M. Cleeves, Redwood City, CA (US);
Michael A. Vyvoda, Fremont, CA (US);
Assignee:
Matrix Semiconductor, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 29/73 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention is a level of an integrated circuit. The level of integrated circuit has a first area having a plurality of features having a first density and the level of the integrated circuit has a second area adjacent to the first area wherein the second area has a plurality of dummy features having a density substantially similar to the first density.
Cleeves, James. (2006). Integrated circuit feature layout for improved chemical mechanical polishing (U.S. Patent No. 6982476). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6982476
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile