The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2005

Filed:

Mar. 04, 2004
Applicants:

Takashi Yoneyama, Sagamihara, JP;

Nobuaki Sakai, Hachioji, JP;

Inventors:

Takashi Yoneyama, Sagamihara, JP;

Nobuaki Sakai, Hachioji, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B021/00 ;
U.S. Cl.
CPC ...
Abstract

In a microscope system in which at least one of a stage on which a sampleis mounted and an objective lenscan move relatively in a direction of an optical axis, a contact judgment sectionjudges the possibility of contact between the sampleand the objective lensbased on a result of comparison between a detection output from a contact sensorwhich detects contact between the sampleand the objective lensand a preset threshold value, excessive contact between the sampleand the objective lensis avoided based on a result of this judgment, and a threshold value in the contact judgment sectionis updated based on the output from the contact sensorevery predetermined time.


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