The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
Dec. 08, 2003
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Pertrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, BE;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Pertrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, BE;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.