The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2005

Filed:

Jan. 29, 2003
Applicants:

Harry K. Charles, Jr., Columbia, MD (US);

Arthur S. Francomacaro, Eldersburg, MD (US);

Allen C. Keeney, Reisterstown, MD (US);

David M. Lee, Hanover, PA (US);

Timothy J. Cornish, Catonsville, MD (US);

Inventors:

Harry K. Charles, Jr., Columbia, MD (US);

Arthur S. Francomacaro, Eldersburg, MD (US);

Allen C. Keeney, Reisterstown, MD (US);

David M. Lee, Hanover, PA (US);

Timothy J. Cornish, Catonsville, MD (US);

Assignee:

The Johns Hopkins University, Baltimore, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J001/46 ; H05K003/06 ;
U.S. Cl.
CPC ...
Abstract

A gating grid for deflecting ions includes an insulating substrate (), a conducting layer () adhered to the insulating substrate (), and interdigitated electrodes () patterned in the conducting layer by a photolithographic process. A hole () in the insulating substrate beneath the interdigitated electrodes allows ions to pass through the hole in the substrate. A process for making a gating grid for deflecting ions includes adhering a conducting layer () to an insulating substrate (), forming interdigitated electrodes () on the conducting layer (), and then forming a hole () in the insulating substrate beneath the interdigitated electrodes.


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