The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2005

Filed:

Aug. 05, 2002
Applicants:

Koichi Sakamoto, Tokyo-to, JP;

Yuichi Takenaga, Tokyo-to, JP;

Takashi Yokota, Tokyo-to, JP;

Kazuhiro Kawamura, Tokyo-to, JP;

Inventors:

Koichi Sakamoto, Tokyo-to, JP;

Yuichi Takenaga, Tokyo-to, JP;

Takashi Yokota, Tokyo-to, JP;

Kazuhiro Kawamura, Tokyo-to, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F019/00 ; H04L021/31 ;
U.S. Cl.
CPC ...
Abstract

A thermal processing method selects a batch size range including the number of workpieces to be processed from a plurality of batch size ranges including batch size ranges in which reference numbers smaller than the holding capacity of a workpiece holder are maximums. The workpieces are distributed in the workpiece holder on the basis of the workpiece distribution pattern determined corresponding to the specified batch size range. Processing conditions of the thermal process are determined according to the workpiece distribution pattern. A thermal processing apparatus comprises a controller capable of carrying out the thermal processing method.


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