The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2005
Filed:
Oct. 06, 2003
Shiqun Gu, Vancouver, WA (US);
Peter Gerard Mcgrath, Portland, OR (US);
Ryan Tadashi Fujimoto, Gresham, OR (US);
Shiqun Gu, Vancouver, WA (US);
Peter Gerard McGrath, Portland, OR (US);
Ryan Tadashi Fujimoto, Gresham, OR (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
Optical emission spectra from a test wafer during a plasma process are measured using a spectrometer. The plasma charging voltage retained by (detected by) the test wafer is measured after the process step is completed. The emission spectra are correlated with the plasma charging voltage to identify the species contributing to the plasma charging voltage. The optical emission spectra are monitored in real time to optimize the plasma process to prevent plasma charging damage. The optical emission spectra are also monitored to control the plasma process drift.