The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2005
Filed:
Oct. 24, 2003
Kyle M. Hanson, Kalispell, MT (US);
Paul Z. Wirth, Columbia Falls, MT (US);
Steven L. Peace, Whitefish, MT (US);
Jon Kuntz, Kalispell, MT (US);
Scott A. Bruner, Kalispell, MT (US);
Kyle M. Hanson, Kalispell, MT (US);
Paul Z. Wirth, Columbia Falls, MT (US);
Steven L. Peace, Whitefish, MT (US);
Jon Kuntz, Kalispell, MT (US);
Scott A. Bruner, Kalispell, MT (US);
Semitool, Inc., Kalispell, MT (US);
Abstract
A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving the alignment pins to form a processing chamber around the workpiece. The alignment pins center the workpiece relative to a rotor spin axis and to an etch or drain groove in the upper rotor. A first fluid outlet delivers processing fluid to a central region of the workpiece. The processing fluid is distributed across the workpiece surface via centrifugal force generated by spinning the processing chamber. Purge gas is optionally delivered into the processing chamber through an annular opening around the first fluid outlet to help remove processing fluid from the processing chamber.