The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Apr. 02, 2003
Applicants:
Zhijian LU, Plano, TX (US);
Kayvan Sadra, Addison, TX (US);
Inventors:
Zhijian Lu, Plano, TX (US);
Kayvan Sadra, Addison, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract
Photo reticles () are formed comprising a first and second printable features (), () which are connected by a channel assist feature (). The size of the channel assist feature is such that the channel assist feature will not substantially print on photoresist that is exposed using the reticle. Third printable features () can be placed a distance Wfrom the channel assist feature (). The channel assist feature will assist in the formation of the third printable feature ().