The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Oct. 28, 2004
Applicant:
Craig A. Hickman, Meridian, ID (US);
Inventor:
Craig A. Hickman, Meridian, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/54 ; G03B027/68 ; G03B027/72 ; G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
A corrective filter for use in an optical system to correct a defect in a reticle and/or pellicle. The corrective filter may be positioned between a light source and the reticle, between the reticle and a wafer, or in combination with the reticle and/or pellicle. The invention provides a method of characterizing the optical properties of the corrective filter in a photolithography system.
Quick Actions:
Hickman, Craig. (2005). Device and method of correcting exposure defects in photolithography (U.S. Patent No. 6967707). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6967707
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile