The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Mar. 06, 2003
Jay Bernard Kirk, Plano, TX (US);
Zuhair Hilali, Dallas, TX (US);
Duy Phan, Garland, TX (US);
Darren S. Lee, Dallas, TX (US);
Duane E. Carter, Plano, TX (US);
Gary A. Evans, Plano, TX (US);
David Alan Willis, Dallas, TX (US);
Jay Bernard Kirk, Plano, TX (US);
Zuhair Hilali, Dallas, TX (US);
Duy Phan, Garland, TX (US);
Darren S. Lee, Dallas, TX (US);
Duane E. Carter, Plano, TX (US);
Gary A. Evans, Plano, TX (US);
David Alan Willis, Dallas, TX (US);
Photodigm, Inc., Richardson, TX (US);
Abstract
A uniform coating is provided using surface features. Multiple ridges or other shapes are fabricated near an area of interest to allow for uniform coating in between the ridges. Areas at either ends of the ridges are left open to allow for excess pooling of photoresist liquid and to aid in obtaining uniform coating. The photoresist liquid or other coating fluid is applied to the sample and spun dry. A soft-bake process is performed to evaporate remaining solvents. An element, such as a diffractive, refractive, or reflective grating structure, is then formed in the area of interest using the uniform photoresist coating.