The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2005
Filed:
Jun. 16, 2004
Yukio Nishimura, Mie, JP;
Noboru Yamahara, Mie, JP;
Masafumi Yamamoto, Mie, JP;
Toru Kajita, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
Hiroshi Ito, San Jose, CA (US);
Yukio Nishimura, Mie, JP;
Noboru Yamahara, Mie, JP;
Masafumi Yamamoto, Mie, JP;
Toru Kajita, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
Hiroshi Ito, San Jose, CA (US);
JSR Corporation, Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1),wherein Rrepresents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, Xrepresents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and Rrepresents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.