The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Sep. 27, 2002
Toshiya Kotani, Sagamihara, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Sachiko Kobayashi, Ichikawa, JP;
Hirotaka Ichiakwa, Yokohama, JP;
Toshiya Kotani, Sagamihara, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Sachiko Kobayashi, Ichikawa, JP;
Hirotaka Ichiakwa, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A mask pattern generation method of generating a mask pattern from a designed pattern, comprising preparing the designed pattern, preparing a correction parameter, preparing a first correction library in which a plurality of pairs of an edge coordinate group and a correction value group to correct the edge coordinate group is registered, acquiring edge coordinate groups of the designed patterns, generating a second correction library in which only the plurality of pairs of an edge coordinate group agreeing with the acquired edge coordinate group and the correction value group is registered in the first correction library and simulation using the correction parameter, and correcting the designed pattern using the second correction library.