The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2005

Filed:

Jun. 09, 2004
Applicants:

Gary J. Johnson, Wappingers Falls, NY (US);

David J. Pinckney, Newtown, CT (US);

Inventors:

Gary J. Johnson, Wappingers Falls, NY (US);

David J. Pinckney, Newtown, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J037/00 ;
U.S. Cl.
CPC ...
Abstract

A carrier for the masks used in Electron Projection Lithography, or other workpieces used in nanotechnology fields, comprises a rectangular frame having a set of four electrostatic chucks in the top surface for holding the mask above a central aperture that has an electron absorber on the bottom for suppressing backscattering; the frame being supported by a bottom carrier that grips the frame with a set of flexures flexible in the z-direction, stiff in an azimuthal direction and flexible in a radial direction.


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