The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2005

Filed:

Dec. 17, 2003
Applicants:

G. Martinez Lopez, Madrid, ES;

Katsushige Tsuno, Akishima, JP;

Inventors:

G. Martinez Lopez, Madrid, ES;

Katsushige Tsuno, Akishima, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J049/44 ; H01J047/00 ; H01J040/00 ;
U.S. Cl.
CPC ...
Abstract

An energy filter with reduced aberration. The energy filter has a first stage of filter for receiving an electron beam entering along the optical axis and for focusing the beam in one direction vertical to the optical axis and a second stage of filter positioned along the optical axis behind the first stage of filter. The beam once focused by the first stage of filter is made to enter the second stage of filter. In the second stage of filter, the orbit of the electron beam is inverted with respect to the focal point. The two stages of filters are identical in length taken along the optical axis. The first and second stages of filters have electric and magnetic quadrupole fields, respectively, along the optical axis. These quadrupole fields make an angle of 45 degrees to the optical axis to achieve astigmatic focusing.


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