The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2005
Filed:
Feb. 28, 2003
Toshiya Uemura, Aichi, JP;
Naohisa Nagasaka, Aichi, JP;
Masaki Hashimura, Aichi, JP;
Atsuo Hirano, Aichi, JP;
Hiroshi Tadano, Aichi, JP;
Tetsu Kachi, Aichi, JP;
Hideki Hosokawa, Aichi, JP;
Toshiya Uemura, Aichi, JP;
Naohisa Nagasaka, Aichi, JP;
Masaki Hashimura, Aichi, JP;
Atsuo Hirano, Aichi, JP;
Hiroshi Tadano, Aichi, JP;
Tetsu Kachi, Aichi, JP;
Hideki Hosokawa, Aichi, JP;
Toyoda Gosei Co., Ltd., Aichi, JP;
Abstract
A process of forming separation grooves for separating a semiconductor wafer into individual light-emitting devices, a process for thinning the substrate, process for adhering the wafer to the adhesive sheet to expose a substrate surface on the reverse or backside of the wafer, a scribing process for forming split lines in the substrate for dividing the wafer into light-emitting devices, and a process of forming a mirror structure comprising a light transmission layer, a reflective layer, and a corrosion-resistant layer, which are laminated in sequence using sputtering or deposition processes. Because the light transmission layer is laminated on the adhesive sheet, gases normally volatilized from the adhesion materials are sealed and do not chemically combine with the metal being deposited as the reflective layer. As a result, reflectivity of the reflective layer can be maintained.