Multi-directional scanning of movable member and ion beam monitoring arrangement therefor

Abstract

Semiconductor processing apparatus is disclosed which provides for movement of a scanning armof a substrate or wafer holder, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperturein a vacuum chamber wall. The armis reciprocated by one or more linear motorsA,B. The armis supported relative to a slideusing gimballed air bearings so as to provide cantilever support for the arm relative to the slide. A compliant feedthroughinto the vacuum chamber for the armthen acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faradayis attached to the armadjacent the substrate holderto allow beam profiling to be carried out both prior to and during implant. The Faradaycan instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.