The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
Jul. 09, 2004
Robert Aigner, Unterhaching, DE;
Martin Franosch, Munich, DE;
Andreas Meckes, Munich, DE;
Klaus-günter Oppermann, Holzkirchen, DE;
Marc Strasser, Munich, DE;
Robert Aigner, Unterhaching, DE;
Martin Franosch, Munich, DE;
Andreas Meckes, Munich, DE;
Klaus-Günter Oppermann, Holzkirchen, DE;
Marc Strasser, Munich, DE;
Infineon Technologies AG, Munich, DE;
Abstract
In a method for generating a protective cover for a device, where a substrate is provided, which comprises the device, first, a sacrificial pattern is generated on the substrate. The sacrificial pattern covers at least an area of the substrate, which comprises the device. Then, a polymer layer is deposited, which comprises at least on sacrificial pattern. Then, an opening will be formed in the polymer layer to expose a portion of the sacrificial pattern. Then, the sacrificial pattern will be removed and the formed opening in the polymer layer is closed.