The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
Jul. 17, 2002
Vincent W. Ku, San Jose, CA (US);
Ling Chen, Sunnyvale, CA (US);
Dien-yeh Wu, San Jose, CA (US);
Alan H. Ouye, San Mateo, CA (US);
Irena Wysok, San Jose, CA (US);
Vincent W. Ku, San Jose, CA (US);
Ling Chen, Sunnyvale, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Alan H. Ouye, San Mateo, CA (US);
Irena Wysok, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for controlling the temperature of at least one gas flowing into a processing chamber is provided. In one embodiment, a gas temperature control apparatus for semiconductor processing includes a gas delivery line coupled between a processing chamber and a gas source. An enclosure substantially encloses the gas delivery line and is adapted to flow a heat transfer fluid away from the processing chamber.