The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Oct. 15, 1998
Applicants:
Hiroshi Ikeda, Kanagawa, JP;
Yasuhiro Kubota, Kanagawa, JP;
Takashi Kyotani, Kanagawa, JP;
Inventors:
Assignee:
Ebara Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01B007/01 ; C01B007/09 ; C01B007/19 ; C01B007/20 ; B01D050/00 ;
U.S. Cl.
CPC ...
Abstract
A process and an apparatus for treating exhaust gases, comprising an aeration stirring tank () employing an aqueous alkaline liquid, and, as a posterior stage, a gas-liquid contact device () and/or a packed column (). The apparatus can remove at the posterior stage harmful gases that the aeration stirring tank fails to remove, for example, water-soluble organic compounds such as ethanol, halogenated silicon compounds such as SiCl, and halogen gases such as Fand Cl. The process and apparatus are particularly suitable for purifying exhaust gases discharged from a semiconductor production device.