The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2005
Filed:
Jan. 23, 2003
Nobutaka Ohyagi, Kawasaki, JP;
Nobutaka Ohyagi, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
There is provided a semiconductor device manufacturing method which comprises a step of forming titanium silicide layers (conductive patterns) on a silicon substrate (semiconductor substrate), a step of forming a cover insulating film (underlying insulating film), a step of forming a laminated film containing an alumina film (metal oxide film) on the cover insulating film, a first etching step of forming first holes in the laminated film by etching the laminated film, a cleaning step of cleaning the first holes, and a second etching step of forming second holes in the cover insulating film by etching the cover insulating film via the first holes under second etching conditions after the cleaning step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile