The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6947122 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 20, 2005

Filed:

Jun. 24, 2003
Applicants:

Tohru Kohda, Utsunomiya, JP;

Shinji Tsutsui, Utsunomiya, JP;

Inventors:

Tohru Kohda, Utsunomiya, JP;

Shinji Tsutsui, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03B027/68 ; G03B027/52 ; G03B027/58 ; G03B027/62 ;
U.S. Cl.
CPC ...
Abstract

A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.


Find Patent Forward Citations

Kohda, Tohru. (2005). Scanning exposure apparatus and method (U.S. Patent No. 6947122). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6947122

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