The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Apr. 27, 2001
Pavel Adamec, Hoar, DE;
Ralf Degenhardt, Landshem, DE;
Hans-peter Feuerbaum, Munich, DE;
Harry Munack, Pfullingen, DE;
Dieter Winkler, München, DE;
Pavel Adamec, Hoar, DE;
Ralf Degenhardt, Landshem, DE;
Hans-Peter Feuerbaum, Munich, DE;
Harry Munack, Pfullingen, DE;
Dieter Winkler, München, DE;
Abstract
The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.